![一种阵列基板、其制作方法、液晶显示面板及显示装置](/CN/2015/1/91/images/201510455126.jpg)
基本信息:
- 专利标题: 一种阵列基板、其制作方法、液晶显示面板及显示装置
- 专利标题(英):Array substrate, manufacturing method therefor, liquid crystal display panel, and display device
- 申请号:CN201510455126.2 申请日:2015-07-27
- 公开(公告)号:CN105097840A 公开(公告)日:2015-11-25
- 发明人: 蔡振飞 , 纪强强 , 刘国全 , 陈正伟
- 申请人: 合肥鑫晟光电科技有限公司 , 京东方科技集团股份有限公司
- 申请人地址: 安徽省合肥市新站区工业园内
- 专利权人: 合肥鑫晟光电科技有限公司,京东方科技集团股份有限公司
- 当前专利权人: 合肥鑫晟光电科技有限公司,京东方科技集团股份有限公司
- 当前专利权人地址: 安徽省合肥市新站区工业园内
- 代理机构: 北京同达信恒知识产权代理有限公司
- 代理人: 黄志华
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; H01L21/77 ; G02F1/1362 ; G02F1/1343 ; G02F1/1368
The invention discloses an array substrate, a manufacturing method therefor, a liquid crystal display panel, and a display device. The manufacturing method comprises the steps: sequentially forming a graph comprising a first electrode, a first insulating layer, a thin film transistor, a second insulating layer, an organic layer, and a second electrode. and only carrying out the normal temperature deposition and wet etching of the second electrode after the organic layer is formed. Compared with a conventional manufacturing method for the array substrate, the method does not need to carry out the high-temperature deposition and dry etching of the insulating layer, thereby protecting film forming equipment and dry etching equipment from being polluted by certain gas and impurities released by the organic layer because of an high-temperature environment. Moreover, there is no need of graph forming technology after the first insulating layer is formed. Compared with a conventional manufacturing method which needs to carry out the photoetching and dry etching of the insulating layer so as to enable a wiring terminal to be exposed, the method can simplifies the manufacturing technology of the array substrate, and reduces the production cost.
公开/授权文献:
- CN105097840B 一种阵列基板、其制作方法、液晶显示面板及显示装置 公开/授权日:2018-12-11