The present invention addresses the problem of having the configuration of an exposure apparatus complicated. This exposure apparatus is provided with: a transfer section that transfers a base material in the transfer direction, said base material having an alignment film formed thereon; a first polarized light output section that outputs, toward the alignment film, first polarized light in the first polarization direction; a second polarized light output section, which is disposed in the downstream of the first polarized light output section in the transfer direction, and which outputs, toward the alignment film, second polarized light in the second polarization direction that intersects the first polarization direction at less than 90 degrees; a first mask section, which is disposed between the base material and the first polarized light output section, and which has formed therein a first opening that passes through the first polarized light for exposing the alignment film, said first mask section blocking the first polarized light; and a second mask section, which is disposed between the base material and the second polarized light output section, and which has formed therein a second opening that passes through the second polarized light for exposing the alignment film, said second mask section blocking the second polarized light. The first opening and the second opening are formed such that a certain region of the alignment film is repeatedly exposed, the first opening includes a first opening region where the first polarized light passes through toward the region, and the second opening includes a second opening region where the second polarized light passes through toward the region.