![一种阵列基板及其制作方法、显示装置及显示补偿方法](/CN/2015/1/18/images/201510092283.jpg)
基本信息:
- 专利标题: 一种阵列基板及其制作方法、显示装置及显示补偿方法
- 申请号:CN201510092283.1 申请日:2015-02-28
- 公开(公告)号:CN104617226B 公开(公告)日:2016-10-05
- 发明人: 杨久霞 , 白峰 , 刘建涛
- 申请人: 京东方科技集团股份有限公司 , 北京京东方光电科技有限公司
- 申请人地址: 北京市朝阳区酒仙桥路10号
- 专利权人: 京东方科技集团股份有限公司,北京京东方光电科技有限公司
- 当前专利权人: 京东方科技集团股份有限公司,北京京东方光电科技有限公司
- 当前专利权人地址: 北京市朝阳区酒仙桥路10号
- 代理机构: 北京中博世达专利商标代理有限公司
- 代理人: 申健
- 主分类号: H01L51/50
- IPC分类号: H01L51/50 ; H01L27/32 ; H01L51/56 ; G09G3/3258
An array substrate and a manufacturing method thereof, and a display device are provided. The array substrate includes: a first electrode, a second electrode and a light-emitting functional layer located between the first electrode and the second electrode. The light-emitting functional layer at least includes an organic light-emitting material layer of a first color and an organic light-emitting material layer of a second color, a color decay rate of the organic light-emitting material layer of the first color being greater than a color decay rate of the organic light-emitting material layer of the second color. The organic light-emitting material layer of the first color at least includes a first sub-layer and a second sub-layer arranged in a stacking manner, and a third electrode is disposed between the first sub-layer and the second sub-layer.
公开/授权文献:
- CN104617226A 一种阵列基板及其制作方法、显示装置及显示补偿方法 公开/授权日:2015-05-13