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基本信息:
- 专利标题: 由低品位硫化矿直接电沉积制备铜铁纳米镀层的方法
- 专利标题(英):Method for preparing copper-iron nano plated layer from low-grade sulfide ore through direct electro-deposition
- 申请号:CN201410750002.2 申请日:2014-12-10
- 公开(公告)号:CN104499002A 公开(公告)日:2015-04-08
- 发明人: 程红伟 , 鲁雄刚 , 李光石 , 谢学良 , 许茜
- 申请人: 上海大学
- 申请人地址: 上海市宝山区上大路99号
- 专利权人: 上海大学
- 当前专利权人: 上海大学
- 当前专利权人地址: 上海市宝山区上大路99号
- 代理机构: 上海上大专利事务所
- 代理人: 顾勇华
- 主分类号: C25C5/02
- IPC分类号: C25C5/02 ; C25D5/10 ; B82Y40/00
The invention discloses a method for preparing a copper-iron nano plated layer from low-grade sulfide ore through direct electro-deposition. The method comprises the following steps: mixing choline chloride and urea in a mole ratio of 1:2, and sufficiently stirring to uniformly mix choline chloride and urea; further adding excessive oxidized roasted sulfide ore powder, and stirring till the valuable metal phase in the roasted powder is completely dissolved in an ionic liquid; by taking an acid activated square titanium sheet as a cathode and a platinum wire as an anode, controlling the temperature of electrolyte to be 80-100 DEG C, the applied voltage to be 1.8V and the electro-deposition time to be 5-7 hours; after electro-deposition is completed, taking out the cathode sheet, washing, and drying in the argon atmosphere at 80-90 DEG C, thereby obtaining a metal plated layer. The method is simple in device, short in procedure and green and environment as the nano metal plated layer is prepared by taking the low-grade oxidized and roasted sulfide ore as a metal source and enriching and extracting metal in the ore through electro-deposition in a choline chloride-urea ionic liquid system.
IPC结构图谱:
C | 化学;冶金 |
--C25 | 电解或电泳工艺;其所用设备 |
----C25C | 电解法生产、回收或精炼金属的工艺;其所用的设备 |
------C25C5/00 | 金属粉末或多孔金属体的电解生产、回收或精炼 |
--------C25C5/02 | .自溶液 |