
基本信息:
- 专利标题: 一种采用超材料电极结构的阻变存储器及其制备方法
- 专利标题(英):Resistive random access memory (RRAM) with metamaterial electrode structure and preparation method of RRAM
- 申请号:CN201410669565.9 申请日:2014-11-20
- 公开(公告)号:CN104485416A 公开(公告)日:2015-04-01
- 发明人: 蔡一茂 , 王宗巍 , 黄如 , 刘业帆 , 余牧溪 , 方亦陈
- 申请人: 北京大学
- 申请人地址: 北京市海淀区颐和园路5号北京大学
- 专利权人: 北京大学
- 当前专利权人: 北京大学
- 当前专利权人地址: 北京市海淀区颐和园路5号北京大学
- 代理机构: 北京君尚知识产权代理事务所
- 代理人: 余长江
- 主分类号: H01L45/00
- IPC分类号: H01L45/00
The invention discloses a resistive random access memory (RRAM) with a metamaterial electrode structure and a preparation method of the RRAM. The resistive random access memory comprises a substrate and an electrode-resistive layer-electrode structure arranged on the substrate, wherein the electrode is of a metamaterial structure capable of producing resonance to an electromagnetic field. The method comprises the steps that firstly, a resistive thin-film material layer is grown with a traditional semiconductor CMOS process on the substrate; then, a photoresist is taken as a sacrificial layer, and an electrode pattern with the metamaterial structure is etched on the resistive thin-film material layer with a photolithography of the traditional thin-film material CMOS process via the sacrificial layer; a metal electrode material is deposited on the etched pattern, and the structure of the resistive random access memory is formed after the sacrificial layer is removed. According to the method, the metamaterial is made into the electrode structure and applied to the resistive random access memory, and the change of a storage state is realized through non-contact excitation of an electromagnetic wave, so that the resistive random access memory can be applied to aspects of an electromagnetic switch, electromagnetic wave detection and the like, thus, greatly enriching the application of the resistive random access memory.
公开/授权文献:
- CN104485416B 一种采用超材料电极结构的阻变存储器及其制备方法 公开/授权日:2018-11-27