
基本信息:
- 专利标题: 降低MOS芯片内阻的封装结构及封装方法
- 申请号:CN201410635001.3 申请日:2014-11-12
- 公开(公告)号:CN104465569B 公开(公告)日:2018-05-01
- 发明人: 肖智轶 , 万里兮 , 沈建树 , 黄小花 , 王晔晔 , 钱静娴 , 翟玲玲 , 杨力
- 申请人: 华天科技(昆山)电子有限公司
- 申请人地址: 江苏省苏州市昆山市开发区龙腾路112号
- 专利权人: 华天科技(昆山)电子有限公司
- 当前专利权人: 华天科技(昆山)电子有限公司
- 当前专利权人地址: 江苏省苏州市昆山市开发区龙腾路112号
- 代理机构: 昆山四方专利事务所
- 代理人: 盛建德; 段新颖
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L21/768 ; H01L21/60
The invention discloses a packaging structure for reducing internal resistance of an MOS chip and a packaging method. The packaging structure comprises a silicon substrate, a first source electrode, a first drain electrode and a first grid electrode of at least one MOS transistor are arranged on the front side of the silicon substrate, blind holes corresponding to the drain electrodes are formed in the back side of the silicon substrate, and a metal layer is laid in the blind holes and the back side of the silicon substrate. The packaging structure can reduce the value of equivalent resistance of the drain electrodes of the MOS chip; besides, the blind holes are formed in the back side of the MOS chip, the strength of the MOS chip is enhanced, and the metal layer is formed in the blind holes and on the back side of the MOS chip so that the heat dissipation effect of the MOS chip can be greatly improved and breakover power consumption can be reduced. The process of conducting overall packaging first and then conducting cutting on the wafer level is adopted for the packaging method and has the advantages that overall cost is greatly lowered compared with current traditional packaging processes.
公开/授权文献:
- CN104465569A 降低MOS芯片内阻的封装结构及封装方法 公开/授权日:2015-03-25
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L23/00 | 半导体或其他固态器件的零部件 |
--------H01L23/48 | .用于向或自处于工作中的固态物体通电的装置,例如引线、接线端装置 |