基本信息:
- 专利标题： 量测方法和设备、衬底、光刻系统以及器件制造方法
- 申请号：CN201380027929.7 申请日：2013-05-01
- 公开(公告)号：CN104350424B 公开(公告)日：2018-01-09
- 发明人： M·杰克 , A·库兰 , H·斯米尔德
- 申请人： ASML荷兰有限公司
- 申请人地址： 荷兰维德霍温
- 专利权人： ASML荷兰有限公司
- 当前专利权人： ASML荷兰有限公司
- 当前专利权人地址： 荷兰维德霍温
- 代理机构： 中科专利商标代理有限责任公司
- 代理人： 张启程
- 优先权： 61/652,552 2012.05.29 US
- 国际申请： PCT/EP2013/059061 2013.05.01
- 国际公布： WO2013/178422 EN 2013.12.05
- 进入国家日期： 2014-11-27
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and −1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity values within each ROI are processed and compared between images, to obtain a measurement of asymmetry and hence overlay error. Separation zones are formed between the component gratings and design so as to provide dark regions in the image. In an embodiment, the ROIs are selected with their boundaries falling within the image regions corresponding to the separation zones. By this measure, the asymmetry measurement is made more tolerant of variations in the position of the ROI. The dark regions also assist in recognition of the target in the images.
公开/授权文献:
- CN104350424A 量测方法和设备、衬底、光刻系统以及器件制造方法 公开/授权日：2015-02-11