基本信息:
- 专利标题： 基板处理装置、处理装置以及元件制造方法
- 申请号：CN201380015932.7 申请日：2013-03-08
- 公开(公告)号：CN104204956B 公开(公告)日：2017-03-08
- 发明人： 加藤正纪 , 木内彻
- 申请人： 株式会社尼康
- 申请人地址： 日本东京都
- 专利权人： 株式会社尼康
- 当前专利权人： 株式会社尼康
- 当前专利权人地址： 日本东京都
- 代理机构： 北京市金杜律师事务所
- 代理人： 陈伟
- 优先权： 2012-069092 2012.03.26 JP 2012-255693 2012.11.21 JP
- 国际申请： PCT/JP2013/056443 2013.03.08
- 国际公布： WO2013/146184 JA 2013.10.03
- 进入国家日期： 2014-09-23
- 主分类号： G03F7/24
- IPC分类号： G03F7/24 ; G03F9/00 ; H01L21/68
A substrate processing apparatus includes: a rotary cylindrical member (DR) that includes a cylindrical supporting surface curved with a constant radius from a predetermined center line (AX2) and that feeds a substrate (P) in a length direction of the substrate; a processing mechanism that performs a predetermined process on the substrate at a specific position (PA, EL2) of a part of the substrate; a scale member (SD) that rotates about the center line along with the rotary cylindrical member so as to measure a displacement in a circumferential direction of the supporting surface of the rotary cylindrical member or a displacement in a direction of the center line of the rotary cylindrical member and that includes a scale portion (GP) carved in a ring shape; and a reading mechanism (EN1, EN2) that faces the scale portion, that is disposed in substantially a same direction as the specific position when viewed from the center line, and that reads the scale portion.
公开/授权文献:
- CN104204956A 基板处理装置、处理装置以及元件制造方法 公开/授权日：2014-12-10