
基本信息:
- 专利标题: 半导体装置的制造方法
- 专利标题(英):Method of manufacturing a semiconductor device
- 申请号:CN201410048867.4 申请日:2014-02-12
- 公开(公告)号:CN103996631A 公开(公告)日:2014-08-20
- 发明人: 松下毅 , 望月英司 , 西泽龙男 , 斋藤俊介
- 申请人: 富士电机株式会社
- 申请人地址: 日本神奈川县
- 专利权人: 富士电机株式会社
- 当前专利权人: 富士电机株式会社
- 当前专利权人地址: 日本神奈川县
- 代理机构: 上海专利商标事务所有限公司
- 代理人: 张鑫
- 优先权: 2013-026593 2013.02.14 JP
- 主分类号: H01L21/60
- IPC分类号: H01L21/60
The invention uses a high Sb soldering materials to weld the insulation circuit basal plate and the semiconductor chip and obtains the welding method achieving a good connection state in which the gaps are fewer. For the Sn-high Sb soldering materials, the oxidized films of which are relatively thick and invasion is bad, the U-shaped soldering tin plate which can reduce the superficial area to perform welding by tin between the insulation circuit board and the semiconductor chip, so that the formation of the oxidized films is less and the welding tin connection surface in which the gaps are to produce can be generated. Furthermore, the semiconductor chip is laminated on the U-shaped welding tin plate, and the gaps are positioned in the welding tin center of the connection surface of the semiconductor chips and the circuit substrate, so that the contact area with the hydrogen is increased and the cleaning effects for the welding tin connection surface by the reduction reaction.
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
--------H01L21/02 | .半导体器件或其部件的制造或处理 |
----------H01L21/027 | ..未在H01L21/18或H01L21/34组中包含的为进一步的光刻工艺在半导体之上制作掩膜 |
------------H01L21/50 | ...应用H01L21/06至H01L21/326中的任一小组都不包含的方法或设备组装半导体器件的 |
--------------H01L21/60 | ....引线或其他导电构件的连接,用于工作时向或由器件传导电流 |