
基本信息:
- 专利标题: 半光亮镍电镀浴及使用其的方法
- 专利标题(英):Semi-bright nickel plating bath and method of using same
- 申请号:CN201280012091.X 申请日:2012-02-08
- 公开(公告)号:CN103415653A 公开(公告)日:2013-11-27
- 发明人: R·A·特雷梅尔
- 申请人: 麦克德米德尖端有限公司
- 申请人地址: 美国康涅狄格州
- 专利权人: 麦克德米德尖端有限公司
- 当前专利权人: 麦克德米德尖端有限公司
- 当前专利权人地址: 美国康涅狄格州
- 代理机构: 北京三幸商标专利事务所
- 代理人: 刘激扬
- 优先权: 13/043,783 2011.03.09 US
- 国际申请: PCT/US2012/024233 2012.02.08
- 国际公布: WO2012/121829 EN 2012.09.13
- 进入国家日期: 2013-09-06
- 主分类号: C25D3/12
- IPC分类号: C25D3/12 ; B05D5/12
A nickel plating bath for plating a semi-bright nickel deposit on a substrate comprising a) nickel sulfations; b) a soluble salt of chloroacetic acid, acetic acid, glycolic acid, proprionic acid, benzoic acid, salicylic acid or chlorobenzoic acid; and c) at least one diol selected from the group consistmg of hexyne diol, butyne diol and combinations of the foregoing. The semi-bright nickel plating bath described herein produces sulfur-free semi-bright deposits over a very wide current density range. The plating bath described herein is at least substantially free of coumarm and produces desirable leveling characteristics. The bath also requires no aldehydes to achieve simultaneous thickness and electrolytic potential (STEP) and has extremely low stress and excellent ductility.
公开/授权文献:
- CN103415653B 半光亮镍电镀浴及使用其的方法 公开/授权日:2016-12-07