The invention is applicable to the technical field of lasers, and provides a pulse laser deposition system. The pulse laser deposition system comprises a laser, a vibration mirror, a focusing mirror, a vibration mirror rotating shaft, a target rotating shaft and a substrate rotating shaft, wherein the laser is used for generating pulse lasers; the vibration mirror is used for projecting the pulse lasers to a target; the focusing mirror is used for focusing the pulse lasers to the target; the vibration mirror rotating shaft is used for driving the vibration mirror to vibrate; the target rotating shaft is used for driving the target to rotate; the substrate rotating shaft is used for driving the substrate to rotate; the vibration mirror is obliquely arranged on the vibration mirror rotating shaft; the vibration mirror rotating shaft and pulse laser beams projected to the vibration mirror are collinear, i.e. the vibration mirror is called a coaxial vibration mirror; and the target rotating shaft and the substrate rotating shaft are not collinear. In the invention, the coaxial vibration mirror is used for scanning, and the incident angles of the pulse lasers on the vibration mirror are identical, so that the reflectivity is constant, and the energies of the pulse lasers reflected by the vibration mirror are identical. In the vibration process of the vibration mirror, the sizes of light spots of the pulse lasers on the target are identical, therefore, components for generating plume, energies and angle distributions thereof are identical, and the uniformity of a deposited film is excellent.