![一种防污自洁聚偏氟乙烯膜的制备方法及其制品](/CN/2009/1/14/images/200910070412.jpg)
基本信息:
- 专利标题: 一种防污自洁聚偏氟乙烯膜的制备方法及其制品
- 专利标题(英):Method for preparing pollution preventing self-cleaning polyvinylidene fluoride (PVDF) film and product thereof
- 申请号:CN200910070412.1 申请日:2009-09-11
- 公开(公告)号:CN101649065A 公开(公告)日:2010-02-17
- 发明人: 郑振荣 , 霍瑞亭 , 杨文芳 , 牛家嵘 , 田俊莹 , 顾振亚
- 申请人: 天津工业大学
- 申请人地址: 天津市河东区成林道63号
- 专利权人: 天津工业大学
- 当前专利权人: 天津工业大学
- 当前专利权人地址: 天津市河东区成林道63号
- 代理机构: 天津翰林知识产权代理事务所
- 代理人: 张国荣
- 主分类号: C08J7/12
- IPC分类号: C08J7/12 ; C08J7/16 ; C08J5/18 ; C08L27/16
The invention relates to a method for preparing a pollution preventing self-cleaning polyvinylidene fluoride (PVDF) film and a product thereof. The method comprises the following processes: (1) PVDF film preparation; and (2) PVDF film processing with alkali liquor, including an alkali-water solution processing process and an alkali-alcohol solution processing process, wherein the alkali-water solution processing process comprises the following steps: soaking the PVDF film in alkali-water solution with the mass concentration of 20-40 percent; processing at 60-80 DEG C for 2-3 hours and then taking out to wash with water; drying and obtaining the PVDF film; the alkali-alcohol solution processing process comprises the following steps: soaking the PVDF film in alkali-alcohol solution with themass concentration of 2-10 percent; processing at 25-40 DEG C for 3-5 minutes and then taking the film out; washing with water and drying; soaking the PVDF film in proper solution to react at 25-60 DEG C for 3-10 minutes; then taking out and fully washing with water; drying and then obtaining the PVDF film; (3) decorating the surface of the PVDF film by organosilane and preparing the pollution preventing self-cleaning polyvinylidene fluoride film. The pollution preventing self-cleaning PVDF film product is prepared by the method.
公开/授权文献:
- CN101649065B 一种防污自洁聚偏氟乙烯膜的制备方法及其制品 公开/授权日:2012-02-08
IPC结构图谱:
C | 化学;冶金 |
--C08 | 有机高分子化合物;其制备或化学加工;以其为基料的组合物 |
----C08J | 加工;配料的一般工艺过程;不包括在C08B,C08C,C08F,C08G或C08H小类中的后处理 |
------C08J7/00 | 高分子物质成形制品的化学处理或涂层 |
--------C08J7/12 | .化学改性 |