基本信息:
- 专利标题： 表面凹凸的制作方法
- 专利标题（英）：Method for manufacturing surface unevenness
- 申请号：CN200880008970.9 申请日：2008-03-19
- 公开(公告)号：CN101636671A 公开(公告)日：2010-01-27
- 发明人： 饵取英树
- 申请人： 木本股份有限公司
- 申请人地址： 日本国东京都
- 专利权人： 木本股份有限公司
- 当前专利权人： 木本股份有限公司
- 当前专利权人地址： 日本国东京都
- 代理机构： 中科专利商标代理有限责任公司
- 代理人： 李贵亮
- 优先权： 078291/2007 2007.03.26 JP
- 国际申请： PCT/JP2008/055092 2008.03.19
- 国际公布： WO2008/117719 JA 2008.10.02
- 进入国家日期： 2009-09-18
- 主分类号： G02B5/02
- IPC分类号： G02B5/02 ; B29C33/38 ; B29C33/42 ; G02B3/00 ; G02F1/1335 ; G02F1/13357 ; B29L11/00
The inventon provides a method for manufacturing surface unevenness, by which a desired uneven shape can be formed easily at a high accuracy by using a photomask. On one side of a photosensitive film (10) composed of a photosensitive resin composite, a mask member (20) having a light permeable section and a non light permeable section is arranged at an interval from the photosensitive film (10), and a light diffusing member (30) is arranged on the side opposite to the photosensitive film (10) of the mask member (20). Light is applied from a light source arranged on the side opposite to the mask member (20) of the light diffusing member (30), and a photosensitive film (10) is exposed through the light diffusing member (30) and the light permeable section of the mask member (20). An exposedsection or unexposed section of the photosensitive film (10) is removed by development, and unevenness determined by the shape of the exposed section or the unexposed section is formed on the photosensitive film (10). In the exposure, exposure conditions such as haze of the light diffusing member (30) are controlled, and the shape of the exposed section or the unexposed section is controlled.
公开/授权文献:
- CN101636671B 表面凹凸的制作方法 公开/授权日：2013-07-10
IPC结构图谱:
| G | 物理 |
| --G02 | 光学 |
| ----G02B | 光学元件、系统或仪器 |
| ------G02B5/00 | 除透镜外的光学元件 |
| --------G02B5/02 | .漫射元件；远焦元件 |