基本信息:
- 专利标题： 用于连续材料的等离子处理设备
- 专利标题（英）：Plant for plasma treatment of endless materials
- 申请号：CN200680039443.5 申请日：2006-09-12
- 公开(公告)号：CN101490793A 公开(公告)日：2009-07-22
- 发明人： 彼得·齐格 , 普利莫兹·艾泽尔特
- 申请人： 彼得·齐格 , 普利莫兹·艾泽尔特
- 申请人地址： 奥地利格拉茨
- 专利权人： 彼得·齐格,普利莫兹·艾泽尔特
- 当前专利权人： 彼得·齐格,普利莫兹·艾泽尔特
- 当前专利权人地址： 奥地利格拉茨
- 代理机构： 北京华夏正合知识产权代理事务所
- 代理人： 孙征
- 优先权： A1496/2005 2005.09.12 AT
- 国际申请： PCT/AT2006/000377 2006.09.12
- 国际公布： WO2007/030850 DE 2007.03.22
- 进入国家日期： 2008-04-22
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
The invention relates to a plant for plasma treatment of an endless material (1) comprising at least one evacuateable discharge chamber (3a), through which the endless material may be continuously transported, a power supply device (30) providing electrical discharge energy to discharge paths (G) between an outer electrode (5, 51-57) for the respective discharge chamber and the endless material as inner electrode. The power supply device is an inherent power source for pulsed delivery of the discharge energy with at least one inductance (32) as energy store, which may be connected to a provided discharge path (G), or successively to several provided discharge paths. The above improves significantly the energy coupling and treatment uniformity or permits the same with contaminated and very hot endless materials. The serial installation of several discharge chambers without intermediate contacts for the endless material is also possible, whereupon sensitive physical plasma processes may be carried out. By application of a strong magnetic field (M) about the endless material (1) the energy coupling and treatment uniformity can be further increased.
公开/授权文献:
- CN101490793B 用于连续材料的等离子处理设备 公开/授权日：2011-10-12