基本信息:
- 专利标题： 膜片结构元件及其制造方法
- 专利标题（英）：Membrane structure element and method of manufacturing same
- 申请号：CN200780011552.0 申请日：2007-03-28
- 公开(公告)号：CN101410999A 公开(公告)日：2009-04-15
- 发明人： 平野贵之 , 川上信之 , 甘中将人
- 申请人： 株式会社神户制钢所
- 申请人地址： 日本兵库县
- 专利权人： 株式会社神户制钢所
- 当前专利权人： 株式会社神户制钢所
- 当前专利权人地址： 日本兵库县
- 代理机构： 中科专利商标代理有限责任公司
- 代理人： 陈平
- 优先权： 087090/2006 2006.03.28 JP
- 国际申请： PCT/JP2007/056723 2007.03.28
- 国际公布： WO2007/114191 JA 2007.10.11
- 进入国家日期： 2008-09-27
- 主分类号： H01L37/00
- IPC分类号： H01L37/00 ; B81C1/00 ; C23C16/42 ; G01F1/692 ; H01L35/34 ; G01J1/02
A membrane structure element which can be easily manufactured, has excellent insulating characteristics and a high quality is provided. A method for manufacturing such membrane structure element is also provided. The membrane structure element is provided with a membrane formed of a silicon oxide film, and a substrate for supporting the membrane in a hollow status by supporting a part of the periphery of the membrane. The method for manufacturing such membrane is provided with a film forming step of forming a heat-shrinkable silicon oxide film (13) on the surface side of a silicon substrate (2) by plasma CVD method; a heat treatment step of performing heat treatment for making the silicon oxide film (13) formed on the substrate (1) shrink with heat; and a removing step of removing a part of the substrate (2) so that a corresponding part of the silicon oxide film (13) to the membrane is supported as a membrane to the substrate (2) in the hollow status, and forming a recessed section (4).