基本信息:
- 专利标题： 用于纳米压印的模子及其制造方法
- 专利标题（英）：Mold for nano-imprinting and method of manufacturing the same
- 申请号：CN200710096093.2 申请日：2007-04-13
- 公开(公告)号：CN101144977A 公开(公告)日：2008-03-19
- 发明人： 李斗铉 , 孙镇升 , 李丙圭 , 赵恩亨
- 申请人： 三星电子株式会社
- 申请人地址： 韩国京畿道
- 专利权人： 三星电子株式会社
- 当前专利权人： 三星电子株式会社
- 当前专利权人地址： 韩国京畿道
- 代理机构： 北京市柳沈律师事务所
- 代理人： 陶凤波
- 优先权： 88629/06 2006.09.13 KR
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F1/14
A nano-imprint mold and a method of manufacturing the same are provided, which can be used for replicating a nano-scaled structure to a polymer film. The nano-imprint mold comprises: a substrate made of materials capable of across ultraviolet rays; a pattern portion having a prominence and depression pattern formed on the substrate and made of ultraviolet ray cured polymers; a hard layer formed of a material with a hardness higher than the pattern portion on a surface of the pattern portion; and a separation layer formed on a surface of the hard layer and assisting to separate the polymers therefrom. In the nano-imprint mold of the present invention, an original pattern can be uniformly replicated even on a substrate with an irregular surface. Further, the pattern can be prevented from being damaged by pressure and being contaminated by synthetic resin, resulting in better accuracy and durability of the pattern.
公开/授权文献:
- CN101144977B 用于纳米压印的模子及其制造方法 公开/授权日：2013-07-03