基本信息:
- 专利标题： 微阵列的制备方法
- 专利标题（英）：Method of producing microarray
- 申请号：CN200580018832.5 申请日：2005-03-31
- 公开(公告)号：CN100574864C 公开(公告)日：2009-12-30
- 发明人： 则竹基生 , 大西孝生 , 广田寿一
- 申请人： 日本碍子株式会社
- 申请人地址： 日本爱知县
- 专利权人： 日本碍子株式会社
- 当前专利权人： 日本碍子株式会社
- 当前专利权人地址： 日本爱知县
- 代理机构： 北京银龙知识产权代理有限公司
- 代理人： 张敬强
- 优先权： 173417/2004 2004.06.11 JP
- 国际申请： PCT/JP2005/006816 2005.03.31
- 国际公布： WO2005/120697 EN 2005.12.22
- 进入国家日期： 2006-12-08
- 主分类号： B01J19/00
- IPC分类号： B01J19/00
There is provided a method of producing the microarray includes the steps of: (A) ejecting the liquid sample (S) discharged from the outlet (4) to outside onto an inspection carrier (65) to form inspection spots (75), inspecting the resultant inspection spots (75) for their quality to determine whether the inspected spots (75) are defective or successful, and detecting the defective discharge unit (51), if any; (B) making the detected defective discharge unit (51) stop discharging the liquid sample (S) from the outlet (4) to outside, to prevent formation of the defective sample spot (71) from the defective discharge unit (51); (C) forming successful sample spots (72) on the carrier (60) using successful discharge units (52) to provide a successful microarray (102) on which the successful spots (72) are aligned in a predetermined pattern on the carrier; and (D) forming a successful spot (72) to be formed originally on the successful microarray (102) at the position of the defective spot (71) where no spot is formed in step (B), thereby providing a finished microarray including the successful spots (72) aligned on the carrier (60) in a predetermined pattern.
公开/授权文献:
- CN1964780A 微阵列的制备方法 公开/授权日：2007-05-16