基本信息:
- 专利标题： 曝光方法、曝光设备以及器件制造方法
- 专利标题（英）：Exposure method, exposure equipment and its manufacture method
- 申请号：CN02104628.X 申请日：2002-02-19
- 公开(公告)号：CN100401191C 公开(公告)日：2008-07-09
- 发明人： 滨谷正人 , 塚越敏雄
- 申请人： 株式会社尼康
- 申请人地址： 日本东京
- 专利权人： 株式会社尼康
- 当前专利权人： 株式会社尼康
- 当前专利权人地址： 日本东京
- 代理机构： 中原信达知识产权代理有限责任公司
- 代理人： 武玉琴; 朱登河
- 优先权： 036,182/2001 2001.02.13 JP; 036,184/2001 2001.02.13 JP; 051,178/2001 2001.02.26 JP; 023,547/2002 2002.01.31 JP; 023,567/2002 2002.01.31 JP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G06F15/16
A computer system comprises a first computer into which target information that an optical apparatus is to achieve is inputted and a second computer that determines the specification of a projection optical system based on the target information received from the first computer via a communication path with using a wave-front aberration amount, which the projection optical system is to satisfy, as a standard. Therefore, in the process of making the projection optical system, higher-order components of the aberration as well as lower-order components can be simultaneously corrected by adjusting the projection optical system based on the result of measuring the wave-front aberration to satisfy the specification, so that the making process becomes simpler. Furthermore, the target that the exposure apparatus is to achieve is securely achieved due to the projection optical system.
公开/授权文献:
- CN1371027A 规格确定方法、投射光学系统制造方法和调节方法、曝光设备及其制造方法以及计算机系统 公开/授权日：2002-09-25